Advanced oxidation processes, like UV/H2O2 oxidation, are important barriers against organic micro pollutants in drinking water treatment. In order to guarantee safe drinking water, it is important to be able to predict the reactors' performance to adjust the operating conditions to the actual influent water characteristics (like UV transmission) and lamp performance. Therefore, a design tool was developed, which is based on a kinetic model that describes and predicts the direct photolysis and oxidation of organic compounds in pilot experiments, using Low Pressure (LP) UV-lamps. This model has been combined with computational fluid dynamics (CFD), in order to be able to accurately predict the results of pilot and full scale installations, and also to design reactor systems. The model was applied to three model compounds (atrazine, ibuprofen and NDMA) in two different pilot reactors, and it has been shown that reactor performance can be fairly predicted by applying this ‘UVPerox’ model. The model takes into account the water quality and power of the lamps, and the properties of the compounds involved.
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Research Article|
September 01 2011
Prediction of advanced oxidation performance in UV/H2O2 reactor systems with LP-UV lamps Available to Purchase
C. H. M. Hofman-Caris;
1KWR Watercycle Research Institute, P.O. Box 1072, 3430 BB Nieuwegein, The Netherlands
E-mail: [email protected]
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D. J. H. Harmsen;
D. J. H. Harmsen
1KWR Watercycle Research Institute, P.O. Box 1072, 3430 BB Nieuwegein, The Netherlands
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B. A. Wols;
B. A. Wols
1KWR Watercycle Research Institute, P.O. Box 1072, 3430 BB Nieuwegein, The Netherlands
2Delft University of Technology, P.O. Box 5048, 2600 GA Delft, The Netherlands
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L. J. J. M. Janssen;
L. J. J. M. Janssen
3bestUV, P.O. Box 5, 2390 AA Hazerswoude, The Netherlands
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E. F. Beerendonk;
E. F. Beerendonk
1KWR Watercycle Research Institute, P.O. Box 1072, 3430 BB Nieuwegein, The Netherlands
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A. H. Knol;
A. H. Knol
4Dunea, P.O. Box 43, 2270 AA Voorburg, The Netherlands
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J. A. M. H. Hofman
J. A. M. H. Hofman
1KWR Watercycle Research Institute, P.O. Box 1072, 3430 BB Nieuwegein, The Netherlands
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Water Supply (2011) 11 (4): 460–467.
Article history
Received:
April 01 2011
Accepted:
July 01 2011
Citation
C. H. M. Hofman-Caris, D. J. H. Harmsen, B. A. Wols, L. J. J. M. Janssen, E. F. Beerendonk, A. H. Knol, J. A. M. H. Hofman; Prediction of advanced oxidation performance in UV/H2O2 reactor systems with LP-UV lamps. Water Supply 1 September 2011; 11 (4): 460–467. doi: https://doi.org/10.2166/ws.2011.070
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