This study investigated the characteristics of Photo Fenton oxidation in comparison with Fenton oxidation in dark environments. The specific objective was to provide an in-depth understanding as to how the presence of UV would effect the reaction and its efficiency as compared to the Dark Fenton Oxidation. All reactions were carried out in batch mode at an initial pH of 3.5, with H2O2 in excess and iron in catalytic concentrations. The medium pressure mercury lamp (320-400 nm) was used as a UV source. The role of UV in Photo Fenton Oxidation of p-chlorophenol was found to be manyfold as compared to Dark Fenton Oxidation. It included the expedition of ferric ion reduction and the photolysis of H2O2, which exerted a direct impact on the p-chlorophenol degradation kinetics by enhancing the production of OH radical. Also included in the role was alteration of the quantity (and potentially quality) of intermediates, which would lead to a change in the decomposition kinetics in an indirect manner. Therefore, it was concluded that the performance of Photo Fenton Oxidation as compared to Dark Fenton Oxidation could vary in complicated ways depending upon the characteristics of target compounds and their intermediates.
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Research Article|
August 01 2000
Characteristics of p-chlorophenol degradation by Photo Fenton oxidation
J. Yoon;
J. Yoon
*Division of Chemical Engineering, College of Engineering, Seoul National University, Kwanak Ku, Shilim dong san 56-1, Seoul 151-742, South Korea
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S. Kim;
S. Kim
**Young In Scientific Co., LTD, Kangnam-Ku, 135-120, Seoul, Korea
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D.S. Lee;
D.S. Lee
***Graduate School of Environmental Studies, Seoul National University
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J. Huh
J. Huh
*Division of Chemical Engineering, College of Engineering, Seoul National University, Kwanak Ku, Shilim dong san 56-1, Seoul 151-742, South Korea
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Water Sci Technol (2000) 42 (3-4): 219–224.
Citation
J. Yoon, S. Kim, D.S. Lee, J. Huh; Characteristics of p-chlorophenol degradation by Photo Fenton oxidation. Water Sci Technol 1 August 2000; 42 (3-4): 219–224. doi: https://doi.org/10.2166/wst.2000.0383
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