The photosensitization of trichloroethene (TCE) in the presence of hydrogen source of surfactant and photosensitizer was investigated. Photolysis experiments were conducted with a Rayonet RPR-200 merry-go-round photoreactor at 253.7 nm. Solutions containing fixed amount of TCE and surfactant Brij 35 were exposed to UV illumination with different concentrations of acetone (ACE). Quantum yield in solution with surfactant Brij 35 and optimum ACE dosage is about 25 times higher than that in Brij 35 alone. However, with an excess ACE dosage, it would act as a light barrier which attenuates the light intensity for TCE photodegradation. A mathematical model is therefore developed for the prediction of TCE photodegradation in Brij 35 solution containing various ACE concentrations, in which the remaining fraction of TCE (C/C0) in the system can be determined. Apart from the direct photodegradation, photosensitization is postulated to be another major pathway contributing to the overall decay.

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