Simulations of UV disinfection systems require accurate models of UV radiation within the reactor. Processes such as reflection and refraction at surfaces within the reactor can impact the intensity of the simulated radiation field, which in turn impacts the simulated dose and performance of the UV reactor. This paper describes a detailed discrete ordinates radiation model and comparisons to a test that recorded the UV radiation distribution around a low pressure UV lamp in a water-filled chamber with a UV transmittance of 88%. The effects of reflection and refraction at the quartz sleeve were investigated, along with the impact of wall reflection from the interior surfaces of the chamber. Results showed that the inclusion of wall reflection improved matches between predicted and measured values of incident radiation throughout the chamber. The difference between simulations with and without reflection ranged from several percent near the lamp to nearly 40% further away from the lamp. Neglecting reflection and refraction at the quartz sleeve increased the simulated radiation near the lamp and reduced the simulated radiation further away from the lamp. However, the distribution and trends in the simulated radiation field both with and without the effects of reflection and refraction at the quartz sleeve were consistent with the measured data distributions.

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